Clear Mask
AGAINST
blemish stress
impurities
Active AGAINST Ingredients: Sulfur², Bentonite², Totarol², Calendula Officinalis Flower Extract², Passiflora Laurifolia (Passionflower) Flower Extract², Menthyl Lactate²
FOR
oil relief
micro-pores
repair support
Active FOR Ingredients: Kaolin², Tocopherol², Copper Gluconate² Glycine Soja (Soybean) Oil², Bisabolol², Allantoin², Hamamelis Virginiana (Witch Hazel) Water²
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